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Semiconductor Advanced Inspection and Metrology Forum

Friday, September 4 | 9:00 am - 3:55 pm
Theme

Enabling Next-Generation Semiconductor Manufacturing with AI & Advanced Inspection & Metrology

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* The organizer reserves the right to adjust or change the agenda. The final agenda is subject to the on-site arrangement.

Featured Speakers

Dr. Zhihua Zou

Dr. Zhihua Zou

Director, TSMC

Keynote Speaker

Dr. R. Joseph Kline

Dr. R. Joseph Kline

Senior Materials Engineer, National Institute of Standards and Technology

Speaker

Dr. Wei-En Fu

Dr. Wei-En Fu

Deputy General Director, Industrial Technology Research Institute

Speaker

Prof. Fernando De Castro

Prof. Fernando De Castro

Dept Head of Science, National Physical Laboratory (NPL)

Speaker

Dr. Philippe Leray

Dr. Philippe Leray

Vice President R&D Advanced Patterning Development, imec

Speaker

Dr. Torsten Mans

Dr. Torsten Mans

Product Manager Secondary Sources | Business Development Semiconductor, TRUMPF Laser SE

Speaker

Mr. Nimrod Shuall

Mr. Nimrod Shuall

Director of Marketing Fab Solutions, Thermo Fisher Scientific

Speaker

Mr. Herve Mace

Mr. Herve Mace

Semiconductor Solution Sales Development Director, TESCAN GROUP, a.s.

Speaker

Mr. Jeff Lee

Mr. Jeff Lee

BU President, Chroma ATE Inc

Speaker

Agenda

Registration

9:00 am - 9:30 am

Welcome Remarks

Dr. I-Shih Tseng

Chroma ATE
9:30 am - 9:35 am

Welcome Remarks

Dr. Yu-Ping Lan

Center for Measurement Standards/ITRI
9:35 am - 9:40 am

Opening Remarks

Mr. Gary Chen

UNIMICRON TECHNOLOGY CORP. 
9:40 am - 9:45 am

Keynote: Challenges and Opportunities for Metrology and Inspection of Advanced Packaging

Dr. Zhihua Zou

TSMC
9:45 am - 10:25 am

Materials and Chemical Metrology to Enable the Semiconductor Industry

Dr. R. Joseph Kline

National Institute of Standards and Technology
10:25 am - 10:50 am

Break Time

10:50 am - 11:05 am

X-Ray Technology for Advanced Semiconductor Manufacturing

Dr. Wei-En Fu

Industrial Technology Research Institute
11:05 am - 11:30 am

TBC

Prof. Fernando De Castro

National Physical Laboratory (NPL)
11:30 am - 11:55 am

Lunch Time

11:55 am - 1:30 pm

Opening Remarks

Ms. Tzuyue Wang

FAVITE INC.
1:30 pm - 1:35 pm

Future metrology challenges, the necessary evil

Dr. Philippe Leray

imec
1:35 pm - 2:00 pm

Laser-driven secondary sources for next-gen Metrology

Dr. Torsten Mans

TRUMPF Laser SE
2:00 pm - 2:25 pm

Break Time

2:25 pm - 2:40 pm

In-Line 3D SEM Metrology and Inspection for Technology Inflections in Memory, Logic and Advanced Packaging

Mr. Nimrod Shuall

Thermo Fisher Scientific
2:40 pm - 3:05 pm

TBC

Mr. Herve Mace

TESCAN GROUP, a.s.
3:05 pm - 3:30 pm

Challenges for CPO Testing

Mr. Jeff Lee

Chroma ATE Inc
3:30 pm - 3:55 pm

Adjournment

3:55 pm