Dr. Philippe Leray

Philippe Leray joined imec in 2001, after being metrology group leader in imec until May 2018, he became the director of advanced patterning, then Vice President R&D of Angstrom Patterning Development in 2025. This department is composed of 150 experts in advanced lithography, imaging, materials, OPC, in-line metrology and inspection development for imec advanced nodes (CFET, High NA, backside patterning, 3DDRAM, etc...). His department is responsible of technical contents of 80 imec customers. During the 12 first years in imec, Dr Leray has been responsible of evaluation of overlay emerging techniques, OCD models developments and immersion defectivity. He contributed to more than 100 publications.