Laser-driven secondary sources for next-gen Metrology

2:00 pm - 2:25 pm

Miniaturization of semiconductor device structures and the adoption of advanced 3D packaging are outpacing conventional metrology, demanding new, robust approaches for high-volume manufacturing. As future device geometries and material stacks evolve, metrology will require higher resolution in x, y, and z-dimensions —and richer material contrast—than today’s radiation sources can deliver. TRUMPF is developing laser-driven “secondary sources” that deliver the next order of brightness and/or flux in the soft x-ray (SXR) and x-ray regimes. We present recent breakthroughs and outline ongoing development activities.

Key Technologies Covered

soft x-ray light source via high harmonic generation (HHG)
laser-Driven x-ray source

Featured Speakers

Dr. Torsten Mans

Product Manager Secondary Sources | Business Development Semiconductor, TRUMPF Laser SE

Torsten Mans studied physics at the RWTH Aachen and the University of Manchester. During his thesis he built the first InnoSlab amplifier and obtained later his doctorate at the Fraunhofer Institute for Laser Technology (Aachen) in the field of ultrashort pulse laser amplification. He is co-founder of AMPHOS GmbH which joined the TRUMPF group in 2018. Currently he is product manager for secondary sources at TRUMPF Laser GmbH, Schramberg, and business developer in the field of semiconductor and microelectronics.