NSS Water Enhancement Technology

Mr. Bjorn Holmstrom, CEO, NSS Water Enhancement Technology

Björn Holmström is the founder and CEO of NSS Water Enhancement Technology AB. He has more than eight years of hands-on experience in advanced water purification, industrial process development and product commercialization. Before founding NSS Water, Björn worked as a process plant designer at Rejlers, gaining strong experience in industrial projects, process systems, CAD design, project management and technical implementation.

Björn has received several innovation awards, including ÅForsk Innovation and SKAPA Innovation, recognizing his work in developing new sustainable industrial technology. He has also participated in leading international accelerator programs and innovation platforms, including UC Berkeley SkyDeck, SpinLab and other deep-tech ecosystems supporting global scale-up.

Under Björn’s leadership, NSS Water has gained international recognition in semiconductor sustainability, including winning the ICT Grand Challenge Taiwan sustainability category for sustainable semiconductor manufacturing. His background combines practical engineering, entrepreneurship and international business development, with a strong focus on scaling deep-tech solutions for high-impact industrial markets.

 

Topic:

Sustainable water solution for advanced semiconductor manufacturing

 

Abstract:

Advanced semiconductor manufacturing depends on ultrapure water, yet fabs are facing increasing pressure from nano-contamination, water scarcity, chemical consumption and solvent waste. As device nodes shrink, water purity becomes directly linked to process reliability, yield and sustainability. This presentation introduces NSS Water’s patented Water Enhancement Technology, a point-of-use platform designed to produce Nanopure® Water directly next to critical process tools. The presentation will cover how advanced water treatment can reduce nano-contamination, lower water and chemical use, enable process water reuse, and support solvent reclaim such as IPA-containing streams. The focus is on how cleaner water can help make advanced fabs more efficient, resilient and sustainable.

 

Key Technologies Covered:

• Advanced water treatment as a yield enabler for next-generation semiconductor manufacturing
• Point-of-use Nanopure® Water production for critical processes
• Reducing fab dependency on large centralized UPW infrastructure and filter chains
• Lowering water and chemical consumption in wafer cleaning 
• Process water reuse to support circular and water-resilient fab operations
• Solvent reclaim, including IPA-containing streams, to reduce waste, cost and environmental impact