Nabu Optical Systems

 

Currently there are no semiconductor tools that allow chip designers to prototype at low cost. Nabu is on a mission to change that with the ANU-1. The only tool on the market that allows users to prototype and enter mid-volume production in one step. With our flagship mask-less thermal lithography tool users can expect high resolution and throughput without the added cost in time and capital that traditional step and scan systems provide. The ANU-1 will allow users to innovate at unprecedented speeds putting your cleanroom or fab in front of the competition.

 

Technology Highlights:

• Maskless allowing for rapid iteration.
• Thermal resist offering higher resolution.
• High throughput 10 wafers per hour plus.
• Integrated to all industry standard CAD software.
• Gray scale with 20nm selectivity.