移至主內容

Redefining Reliability through Design for Testing: Decoding Failure Mechanisms in Next-Gen AI Testing

下午 3:25 - 下午 3:50

As Next-Generation AI architectures push the boundaries of computational density and power efficiency, traditional testing methodologies are reaching their breaking point. The shift toward massive parallel processing and heterogeneous integration necessitates a fundamental paradigm shift: moving from reactive post-silicon validation to proactive Design for Testing (DfT). This presentation, titled "Redefining Reliability through Design for Testing: Decoding Failure Mechanisms in Next-Gen AI Testing," explores the critical intersection of architectural design, test hardware limitations, and long-term system reliability.

We will delve into four core failure mechanisms and engineering challenges unique to next-gen AI accelerator testing:

  • The Critical Demand for Low Contact Resistance (Cres) and Its Direct Correlation with Test Yield: Examining how micro-ohm fluctuations under high current densities induce localized overheating and trigger false failures.
  • The Impact of Contact Stability Co-grounding Ratio on Signal Integrity (SI) and TDR Performance: Analyzing how subtle variations in probe-to-pad contact disrupt high-speed data paths and impedance matching during Time-Domain Reflectometry.
  • The Severe Test Challenges Imposed by Ultra-Large Packages (100x100mm and above): Addressing hardware bottlenecks related to severe substrate warpage, massive total actuation force, and multi-die coplanarity issues.
  • The Influence of Advanced Solder Materials on Testing Stability: Investigating how next-gen low-temperature solders or specialized alloys lead to material transfer, probe tip contamination, and irregular burn-in/test marks under repetitive cycling.

By integrating advanced DfT techniques, optimized test interface hardware, and real-time telemetry, engineers can decode these intricate failure patterns before they escalate into systemic collapses.

Ultimately, this session provides a strategic roadmap for semiconductor leaders to bridge the gap between cutting-edge performance and high-volume manufacturing (HVM) test reliability, ensuring that the next wave of AI innovation is built on a foundation of uncompromising stability.

 

Key Technologies Covered

  • Next-Gen AI Architectural Bottlenecks: AI architectures are pushing computational density and power efficiency to their limits, driving traditional testing methodologies to a breaking point.

  • Test Paradigm Shift: The industry must undergo a fundamental transition from reactive post-silicon validation to proactive Design for Testing (DfT).

  • Core Presentation Focus: This session explores the critical intersection of architectural design, test hardware limitations, and long-term system reliability.

  • Cres Impact and Direct Correlation to Yield: Under extreme current densities, micro-ohm fluctuations in Contact Resistance (Cres) induce localized overheating, triggering false failures and directly impacting manufacturing test yield.

  • Co-grounding Ratio & SI Disruption: Inadequate co-grounding ratios and subtle probe-to-pad contact variations disrupt high-speed data paths, breaking impedance matching and severely degrading Time-Domain Reflectometry (TDR) accuracy.

  • Ultra-Large Package Bottlenecks: Managing packages sized 100x100mm and above pushes traditional production test equipment and hardware interfaces to their physical limits.

  • Substrate Warpage & Coplanarity: Testing must overcome severe thermal-induced substrate warpage and complex multi-die coplanarity challenges in large form factors.

  • Massive Mechanical Actuation Stress: Ultra-large form factors require immense total actuation force, creating unprecedented mechanical stress on test fixtures and socket hardware.

  • Probe Contamination & Wear: Repetitive test cycling leads to material transfer, probe tip contamination, and irregular test marks, significantly shortening probe and socket lifespans.

  • Multi-Dimensional Integration: By leveraging advanced DfT techniques, optimized test interface hardware, and real-time telemetry, engineers can decode and intercept complex failure modes early.

Featured Speakers

Dr. Collins Sun

孫家彬博士

技術處長, 穎崴科技股份有限公司

My name is Collins Sun, and I am the Technical Director at WinWay Technology in Taiwan. With over 15 years of experience in material science, high-speed product development, and thermal solutions, I had led teams in developing advanced semiconductor testing technologies. I hold a Ph.D. in Physics from National Sun Yat-Sen University, Taiwan. My career has been driven by a passion for innovation and problem-solving. I take pride in bridging academic knowledge with industrial applications, continuously learning and adapting in the fast-paced tech environment. I aim to contribute to next-generation electronic testing solutions that shape the future of semiconducting testing technology.