Materials and Chemical Metrology to Enable the Semiconductor Industry

上午 10:25 - 上午 10:50

The semiconductor industry is pushing towards smaller and more complex three-dimensional structures. Advances in materials science and chemistry are critical to the successful development of next generation semiconductors. The Materials Measurement Laboratory (MML) at the National Institute of Standards and Technology (NIST) has a broad expertise across wide range of measurement science from nanoscale characterization to detection of trace impurities in gases. The presentation will give an overview of MML’s research efforts in the semiconductor sector, highlight several projects, and discuss how MML is developing new standards and reference materials to enable critical measurements needed for advanced semiconductor manufacturing.

Key Technologies Covered

Dimensional metrology
Nanoscale characterization
Advanced packaging metrology
Chemical purity analysis
Standards and reference materials

Featured Speakers

Dr. R. Joseph Kline

Senior Materials Engineer, National Institute of Standards and Technology

R. Joseph Kline leads the Metrology for Nanolithography project at NIST. He investigates X-ray based dimensional metrology of nanostructures and characterization of EUV photoresists for the semiconductor industry. He received his Ph.D. in Materials Science and Engineering at Stanford University in 2005 and BS and MS in Material Science and Engineering from North Carolina State University. He joined NIST as a National Research Council Postdoctoral Fellow in 2005 and has been on the staff since then. He has published more than 100 articles, 4 book chapters, and given more than 70 invited presentations. He has received the Presidential Early Career Award for Science and Engineering, the Department of Commerce Gold Award, and the Arthur S. Flemming Award.