柳澤 道彦博士
部長, 台灣康肯環保設備有限公司
Dr. YANAGISAWA is the Director and General Manager of the Technology Development Division at Kanken Techno Co., Ltd. He received his Ph.D. in Engineering from the Graduate School of Engineering, The University of Tokyo in 2003, and the research conducted during his doctoral studies later provided the foundation for the development of the NC‑LDE (Numerically Controlled Local Dry Etching) technology, a localized plasma‑based dry etching system capable of producing ultra‑flat silicon wafers. This technology enabled the fabrication of highly planarized Si wafers and contributed to the continued miniaturization of semiconductor devices.
His areas of expertise include plasma etching and plasma reaction engineering, and he has been extensively involved in the research and development of advanced plasma processing technologies throughout his career. His current responsibilities include leading the development of high‑performance, high‑function, and energy‑efficient abatement systems, contributing to improved environmental performance and productivity in semiconductor manufacturing.
He is currently engaged in the development of new, energy‑efficient, and environmentally friendly exhaust‑gas treatment systems for semiconductor manufacturing facilities, advancing technologies that reduce environmental impact while maintaining high operational performance.