Navigating the Patterning Landscape in the Era of AI-Driven Semiconductor Manufacturing

3:30 pm - 3:55 pm

Artificial intelligence is driving the most rapid technology adoption in history, fundamentally reshaping the global digital economy. As the industry races to meet the demands of AI and high-performance computing, chip manufacturing is pushing the limits of both logic and memory architectures. Behind these advancements, materials suppliers are engineering the largest, most complex set of patterning materials ever seen.

While the number of semiconductor manufacturers implemented the latest patterning technologies has consolidated over the years, the ecosystem of specialized materials suppliers has increased. This presentation will share how Brewer Science leverages its advanced materials portfolio to navigate this shifting landscape, ensure supply chain resilience and deliver the high-selectivity, patterning and advanced packaging solutions critical for next-generation lithography.

Key Technologies Covered

Material development technologies driven by AI.
Diversification of patterning materials.
Underlayer development for advance patterning nodes.

Featured Speakers

Dr. Douglas Guerrero

Technology strategy and management, Brewer Science, Inc.

Douglas Guerrero is responsible for Technology Strategy and Management reporting to the CTO office. He has been assigned to imec in Leuven, Belgium since 2008. He joined Brewer Science in 1995 and led the development and commercialization of several Anti-reflecting coating products. He holds a PhD in Organic Chemistry from the University of Oklahoma, completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers. Dr. Guerrero is a SPIE Fellow and former chair of the SPIE Advances in Patterning Materials and Processes conference. He has served in several international symposia committees and has published over 80 papers and patents on optoelectronic materials, underlayers for lithography, reflection control, and DSA.