ALD innovations for advanced semiconductor nodes

2:25 pm - 2:50 pm

The semiconductor industry continues to advance chip performance via transition to 3D device architectures, as well as breakthroughs in materials and process innovations. Atomic Layer Deposition (ALD) is an essential deposition technology for enabling these complex device structures, and for the introduction of new materials, films, and layers across Logic and DRAM technologies. ALD enables ultrathin, highly conformal films with excellent step coverage and atomic control, required in the AI era of angstrom scale technology nodes.

 

Herein, we will discuss ALD enabled current and future materials and process technologies for advanced semiconductor nodes.

 

Key Technologies Covered

  • ALD for advanced semiconductor node manufacturing
  • 3D device architecture enablement through next-generation deposition techniques
  • Ultrathin, highly conformal film deposition with excellent step coverage
  • Atomic-Scale Process Control for angstrom-level technology nodes
  • Novel Materials Integration for next-generation logic and memory devices
  • ALD process innovation for logic technologies and DRAM technologies
  • New film and layer introduction for complex device structures
  • Precursor and gas chemistry development supporting advanced deposition
  • Materials & process co-innovation for angstrom-era chip scaling

Featured Speakers

Mr. Abhudaya Mishra

Dr. Abhudaya Mishra

Corporate Director, ASM

Abhudaya Mishra is Corporate Director at ASM and Head of Global Chemical Innovation and Strategy. He is part of ASM’s Office of the CTO and leads the company’s deposition precursor and gases team.

 

Abhu has more than 20 years of experience spanning semiconductor R&D, technology development, and commercial and business unit leadership. At ASM, he was previously the Head of PECVD business unit for two years and has served in his current role for three years. Earlier, he spent 10 years at Fujifilm Electronic Materials in leadership roles, culminating as Technology Director and Head of R&D and Process Development for CMP slurries and post-CMP cleans.

 

Abhu holds a B.S. from IIT Kharagpur, India, and a Ph.D. from the University of Florida. He has authored more than 25 peer-reviewed journal publications, with over 2,000 citations, and holds more than 80 granted patents. He is also a two-time R&D 100 Award winner for products he helped develop.