Plasma and laser applications in the semiconductor value chain with a focus on glass panel process for advanced packaging
Precision and efficiency are the two major elements of semiconductor wafer fabrication, and with over-hundred-year-history TRUMPF combines its laser technology and plasma power supply cutting-edge technology to provide a full range of solutions for advanced packaging, reducing costs and increasing efficiency, and achieving AI-driven market expansion with revenue growth for enterprises.
Glass is an enabling material for modern chips: its low dielectric loss, dimensional and thermal stability, and compatibility with micrometer-scale features make it ideal for high-density interconnects and panel-scale manufacturing. Laser and plasma methods together form the core of scalable glass panel processing. Ultra-short pulse lasers enable precise, contactless modification of glass for high-aspect-ratio vias and fine structures with minimal thermal damage, supporting micrometer-scale vias and high via densities across large panels. Complementary plasma processes provide controlled material removal, surface functionalization and contamination-free interfaces essential for reliable metallization and assembly. Together, laser and plasma solutions deliver the accuracy, throughput and surface quality required to scale glass interposers and glass-core substrates from R&D to high-volume manufacturing in next-generation heterogeneous packaging.
Key Technologies Covered
- EUV, plasma and laser processes in semiconductor value chain
- CVD, MOCVD, PVD and plasma etch processes
- Ultra-short pulse laser modification of glass panels
- High-Impulse Magnetron Sputtering process enabling TSV/TGV filling