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SMC Taiwan Poster Display

Thursday, September 19
9:00am to 4:00pm

 

Display Time Location
09:00 – 17:00, September 19, 2019 FUTURE Stage, Booth #M1148, 4F, TaiNEX 1
10:00 – 16:00, September 20, 2019 K Zone

 

 

 

 

Poster Topic Presenter Author(s)
1. Vertically Stacked GeSi GAA n-Channels on a Si Channel by CVD Epitaxy

Chung-En Tsai

C. W. Liu, Chung-En Tsai, Yi-Chun Liu, Yu-Shiang Huang, Fang-Liang Lu, and Hung-Yu Ye
2. Atomic Layer Technologies: Atomic Layer Annealing, Bombardment, Crystallization, Densification, Epitaxy, and Etching Miin-Jang Chen Yu-Tung Yin, Miin-Jang Chen
3. Reliability Improvement of HfO2-based Ferroelectric Memory by Interface Engineering Yung-Hsien Wu Kuen-Yi Chen, Pin-Hsuan Chen, Ruei-Wen Kao, Chuan-Pu Chou, Yan-Xiao Lin, Yan-Hua Huang and Yung-Hsien Wu
4. High Sensitivity Ion Detector by 16nm FinFET CMOS Technology Chien-Ping Wang Chien-Ping Wang
5. The Interface Electrical Properties of Tens-of-Nanometer Thick Graphene on Few-Layer MoS2 Flakes Hao-Wei Tu Hao-Wei Tu, Chin-Lung Lin, Jing-Jia Lin, Wen-Bin Jian, Chenming Hu
6. Large-Scale Growth of Two-Dimensional Materials toward Phase-Engineered Hybrid Films Ling Lee Ling Lee(李寧), and Yu‐Lun Chueh(闕郁倫)
7. Dielectric Properties Measurement Technology of  Material in mmWave Application Chun An Lu Chiung Hsiung Chen, Chun An Lu, Yi Chen Wu, Cheng Ping Lin, Kyoko Nishidono
8. From wafer to solution: Organic impurities analysis strategy in advanced node Po-Cheng Chen Po-Cheng Chen, Hao Chang, Edward Chan, C.R.Liang, Chunghsi Joe Wu
9. Material impurity control: The staples of the quality assurance Shu-Hua Chou Shu-Hua Chou, Yi-Hsiu Hsiao, Chunghsi Joe Wu
10. Importance of electrostatic discharge (ESD) at advanced semiconductor materials manufactory Yu-Lun Hsiao Yu-Lun Hsiao, Chung-Yu Lin, Joe Wu, Y.K. Fan, W.C Yang,
11. A Novel Metal Gate Protective Film and Device Structures Thereof Chandrashekhar Prakash SAVANT Chandrashekhar Prakash SAVANT, Tien-Wei YU, Chia-Ming TSAI
12. Material Quality Roadmap Ming-Yuan Lin Ming-Yuan Lin, Ming-Hsi Sung , Liang-Chen Chi, Chunghsi Joe Wu
13. CMR Screening in semiconductor manufacturing chemicals Zack Su Zack Su, Zoe Chung, C.F. Wang , Shih-Hao Wang
14. History and Development of Trace Metal Impurities Analysis Technology

toward Semiconductor advance process

Heng-Yan Liu Heng-Yan Liu, Takuya Morimoto, Sylvia Huang, Henry Tseng, Jerry Lu
15. Real-time measurement of precursor vapor concentration using the non-dispersive Infrared spectroscopy Masakazu Minami M. Minami and Dr. YL Tsai
16. AlN Removal Formulation with modified anisotropic silicon etching property Chung Yi Chang Chung Yi Chang, Wen Dar Liu, Yi Chia Lee, John G Langan, Tianniu Rick Chen, Aiping Wu , Hung-Yu Chen

 

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